Silicon Nitride for Microelectronic Applications

Name: Silicon Nitride for Microelectronic Applications
Brand: Springer-Verlag New York Inc.
SKU: 9781468461640
Price: 99.65 EUR
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Part 1 Preparation and Properties

Autor: John T. Milek

Jazyk:

Väzba: Brožovaná

Vydavateľ: Springer-Verlag New York Inc.

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The large amount of literature on the technology of thin film silicon nitride indi cates the interes...

Informácie o knihe

Autor

John T. Milek

Jazyk

Angličtina

Väzba

Kniha - Brožovaná

Vydalo

2013

Stránok

118

EAN

9781468461640

ISBN

1468461648

Enbook ID

02005958

Vydavateľ

Springer-Verlag New York Inc.

Hmotnosť

333

Rozmery

210 x 279 x 8

Kompletný popis

The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation 5 Introduction 5 Direct Nitridation Method 8 Evaporation Method 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.

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Silicon Nitride for Microelectronic Applications

Part 1 Preparation and Properties

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