Semiconductor Wafer Cleaning Using Megasonics

Name: Semiconductor Wafer Cleaning Using Megasonics
Brand: VDM Verlag Dr. Mueller E.K.
SKU: 9783639090307
Price: 56.83 EUR
Availability: InStock

Role of Electro-Acoustic and Cavitation Effects in Electrolyte Solutions

Autor: Keswani Manish

Jazyk:

Väzba: Brožovaná

Vydavateľ: VDM Verlag Dr. Mueller E.K.

Dostupnosť: Skladom u dodávateľa

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56.83 €

Megasonic cleaning is routinely used in the §semiconductor industry to remove particle §contaminants...

Informácie o knihe

Autor

Keswani Manish

Jazyk

Angličtina

Väzba

Kniha - Brožovaná

Vydalo

2008

Stránok

172

EAN

9783639090307

ISBN

3639090306

Enbook ID

06818136

Vydavateľ

VDM Verlag Dr. Mueller E.K.

Hmotnosť

248

Rozmery

154 x 227 x 9

Kompletný popis

Megasonic cleaning is routinely used in the §semiconductor industry to remove particle §contaminants from wafer and mask surfaces. Cleaning §is achieved through proper choice of chemical §solutions, power density & frequency of acoustic §field. Considerable work has been done to increase §the understanding of particle removal mechanisms in §megasonic cleaning using different solution §chemistries with varying ionic strengths. However, §to date, the focus of all these studies of particle §removal has been either cavitation or acoustic §streaming. It is well known that the propagation of §sound through a colloidal dispersion containing ions§results in the generation of two types of §oscillating electric potentials, namely, Ionic §Vibration Potential & Colloid Vibration Potential. §This book reviews some of the current work that §shows that these potentials and their associated §electric fields can exert significant forces on §charged particles adhered to a surface, resulting in§their removal.

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Semiconductor Wafer Cleaning Using Megasonics

Role of Electro-Acoustic and Cavitation Effects in Electrolyte Solutions

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