Plasma Technology

Name: Plasma Technology
Brand: Springer-Verlag New York Inc.
SKU: 9781461365020
Price: 50.18 EUR
Availability: InStock

Fundamentals and Applications

Autor: M. Capitelli, C. Gorse

Jazyk:

Väzba: Brožovaná

Vydavateľ: Springer-Verlag New York Inc.

Dostupnosť: Skladom u dodávateľa

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50.18 €

The present book contains the proceedings of the workshop "Plasma Technology and Applications" which...

Informácie o knihe

Autor

M. Capitelli, C. Gorse

Jazyk

Angličtina

Väzba

Kniha - Brožovaná

Vydalo

2012

Stránok

224

EAN

9781461365020

ISBN

9781461365020

Enbook ID

06618250

Vydavateľ

Springer-Verlag New York Inc.

Hmotnosť

456

Rozmery

178 x 254 x 13

Kompletný popis

The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A. M. Ignatov and A. A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i , R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A.

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