Kniha Plasma Etching Minoru Sugawara

Plasma Etching

Fundamentals and Applications

Jazyk: Angličtina
Väzba: Pevná
Dostupnosť: Skladom u dodávateľa
Odosielame za 10-18 dní
245.78
The focus of this book is on the remarkable advances in understanding of low pressure RF (radio freq...

Informácie o knihe

Jazyk
Angličtina
Väzba
Kniha - Pevná
Vydalo
1998
Stránok
356
EAN
9780198562870
ISBN
019856287X
Enbook ID
04527765
Hmotnosť
743
Rozmery
163 x 242 x 23

Kompletný popis

The focus of this book is on the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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