Kniha Modelling Fluid Flow J. Vad

Modelling Fluid Flow

The State of the Art

Jazyk: Angličtina
Väzba: Pevná
Dostupnosť: Skladom u dodávateľa v malom množstve
Odosielame za 13-18 dní
162.98
Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a...

Informácie o knihe

Jazyk
Angličtina
Väzba
Kniha - Pevná
Vydalo
2004
Stránok
434
EAN
9783540220312
ISBN
3540220313
Enbook ID
05273734
Hmotnosť
912
Rozmery
155 x 235 x 33

Kompletný popis

Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a recent international conference CMFF '03 on fluid technology. The lectures follow the current evolution and the newest challenges of the computational methods and measuring techniques related to fluid flow. The workshop summaries reflect the recent trends, open questions and unsolved problems in the mutually inspiring fields of experimental and computational fluid mechanics. The papers cover a wide range of fluids engineering, including reactive flow, chemical and process engineering, environmental fluid dynamics, turbulence modelling, numerical methods, and fluid machinery. TOC:From the contents:Application of CFD-Techniqes in Fluid Machinery.- Modelling Separation from Curved Surfaces with Anisotropy-Resolving Turbulance Closures and Related Supplementary Observations on LES.- Development of Fluid Mechanics Methods in the 20th Century and the Application to Laminar and Turbulent Flow Investigations.- Theodor Von Kármán: A Global Life.- Workshop Summaries.- Workshop on Complex Flows with Chemical Reactions.- Numerical Modelling of Turbomachinery Fluid Dynamics.- Challenges in Optimisation of Axial Flow Turbomachinery Blades for 3D Flow, Including Sweep and Dihedral Effects.- Flows with Chemical Reactions; Chemical and Process Engineering; Environment; External Fluid Dynamics.- Flame Stabilization of Highly Diffusive Gas Mixtures in Porous Inert Media.- A Hybrid Approach to Model Combustion Instabilities.- Modelling of Reaction and Transport in Chemical Vapor Deposition: Predictions of Growth and Uniformity of Tin Oxide Films.

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