Kniha Materials and Processes for Next Generation Lithography Alex Robinson

Materials and Processes for Next Generation Lithography

Autor: Alex Robinson
Jazyk: Angličtina
Väzba: Pevná
Dostupnosť: Skladom u dodávateľa
Odosielame za 10-18 dní
187.92
These developments in both the industrial and the academic lithography arenas have led to the prolif...

Informácie o knihe

Jazyk
Angličtina
Väzba
Kniha - Pevná
Vydalo
2016
Stránok
634
EAN
9780081003541
ISBN
0081003544
Enbook ID
10000207
Hmotnosť
1450
Rozmery
152 x 229 x 35

Kompletný popis

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place

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