Atomic Layer Deposition

Name: Atomic Layer Deposition
Brand: John Wiley & Sons Inc
SKU: 9781118062777
Price: 199.62 EUR
Availability: InStock

Principles, Characteristics, and Nanotechnology Applications

Autor: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman

Jazyk:

Väzba: Pevná

Vydavateľ: John Wiley & Sons Inc

Dostupnosť: Skladom u dodávateľa

Odosielame za 9-15 dní

199.62 €

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf...

Informácie o knihe

Autor

Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman

Jazyk

Angličtina

Väzba

Kniha - Pevná

Vydalo

2013

Stránok

272

EAN

9781118062777

ISBN

1118062779

Enbook ID

04949772

Vydavateľ

John Wiley & Sons Inc

Hmotnosť

582

Rozmery

240 x 164 x 25

Kompletný popis

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Informácie o knihe

Kompletný popis

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