Atom Lithography

Name: Atom Lithography
Brand: LAP Lambert Academic Publishing
SKU: 9783843371964
Price: 42.4 EUR
Availability: InStock

From Newtonian to Path integral approach

Autor: Monsit Tanasittikosol

Jazyk:

Väzba: Brožovaná

Vydavateľ: LAP Lambert Academic Publishing

Dostupnosť: Skladom u dodávateľa

Odosielame za 8-11 dní

42.40 €

This book discusses two approaches used as the tools to study atom lithography. The book begins with...

Informácie o knihe

Autor

Monsit Tanasittikosol

Jazyk

Angličtina

Väzba

Kniha - Brožovaná

Vydalo

2010

Stránok

EAN

9783843371964

Enbook ID

07116200

Vydavateľ

LAP Lambert Academic Publishing

Hmotnosť

130

Rozmery

150 x 220 x 5

Kompletný popis

This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated.

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Atom Lithography

From Newtonian to Path integral approach

Informácie o knihe

Kompletný popis

Mohlo by vás zaujímať

Zákazníci, ktorí si kúpili túto knihu, kúpili tiež